Product Overview
- For 4-inch and 6-inch gallium arsenide wafers, including processes using semi-insulating and conductive GaAs substrates.
- Application areas include wafer metallisation for RF devices, VCSEL optoelectronic devices and GaAs photovoltaic cells.
- Integrates automated wafer transfer, pre-wetting, electroplating, rinsing and drying in a modular chamber design.
- Supports SECS/GEM communication and closed-loop process control of chemical concentration, temperature and current density.
- Process configurations address GaAs brittleness, stress and plating requirements. Contact us for detailed capacity information and test conditions.
Equipment configurations can be tailored to requirements. Contact us for detailed specifications, process performance and test conditions.

